Functional materials Q. Evrard1, N. Sadegh1, S. Mathew2, E. Zuidinga2, B. Watts3, M. Paradiz Dominguez2, A. Giglia4, N. Mahne4, S. Nannarone4, A. Nishimura5, T. Goya5 T. Sugioka5, M. Vockenhuber3, Y. Ekinci3, A.M. Brouwer1,2 1 Advanced Research Center for Nanolithography, Amsterdam, The Netherlands 2 Van't Hoff Institute for Molecular Sciences, University of Amsterdam, Amsterdam, The Netherlands 3 Paul Scherrer Institute, Villigen, Switzerland 4 CNR - Istituto Officina dei Materiali (IOM), Trieste, Italy 5 Nippon Shokubai, Osaka, Japan e-mail: quentin.evrard@iit.it; a.m.brouwer@uva.nl Acknowledgments This project has received funding from the European Union’s Horizon 2020 research and innovation program under the Marie SkłodowskaCurie grant agreement no. 722149. We used the Dutch national e-infrastructure with the support of the SURF Cooperative under grants EINF-1911 and EINF-4039. The Paul Scherrer Institute provided access to the PolLux beam line (proposals 20180709 and 20182195) and the XIL beam line (proposals 20220787, 20200726 and 20212384). The PolLux end station was financed by the German Ministerium für Bildung und Forschung (BMBF) through contracts 05K16WED and 05K19WE2. We acknowledge Elettra Sincrotrone Trieste for providing access to its synchrotron radiation facilities and for financial support. Part of the work was carried out at ARCNL, a public-private partnership of UvA, VU, NWO, and ASML. Original paper Q. Evrard et al., ACS Appl. Mater. Interfaces 16, 42947 (2024); DOI:10.1021/acsami.4c08636. Fig. 1 Figure 1. (a) molecular structures of the tin-oxo-hydroxo cages investigated in this work. (b) x-ray photoelectron spectra showing the loss of hydrocarbon (285 eV) and (relative) retention of fluorocarbon atoms (288 eV) upon in situ EUV exposure at the BEAR beamline. (c) mechanistic sketch. Copyright © 2024 The Authors. Published by American Chemical Society. This publication is licensed under CC-BY 4.0. Elettra Highlights 2024–2025 19
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