Seminars Archive

MAXIMUM at ALS

Abstract
We report on the new arrangement of the spectromicroscope MAXIMUM in its final location, at beamline 12.0 at the Advanced Light Source. The great improvement in flux allows the operational lateral resolution of 0.1 mm and the spectral resolution of 0.3 eV. In the new configuration, the acquisition time is down to 2 min per image. The microscope design allows to perform the Schwarzschild objective and the Kirkpatrick-Baez alignment in situ, as well as to pre-investigate the samples with an optical microscope on line. The experimental arrangement permits also to pass current, to measure voltage and to heat the samples in situ, as well as to deposit, sputter and cleave samples. We will discuss here also the first results obtained on GaN, Al-Cu interconnects and more.