Seminars Archive
Pulsed laser deposition of nanostructured SnO2 thin films and Pt nanoclusters for the development of gas sensors
Abstract
Monday, March 31, 2003, 14:30
Seminar Room, ground floor, Building "T"
Sincrotrone Trieste, Basovizza
Pulsed laser deposition of nanostructured SnO
2
thin films and Pt nanoclusters for the development of gas sensors
Richard Dolbec
(Universit du Qubec-Canada)
Abstract
Pulsed laser deposition (PLD) is a versatile method that has been used
to deposit a variety of materials under a wide range of growth conditions,
offering thereby the prospect of growing new nanostructures. In the case
of tin oxide (SnO2) thin films, the process parameters (namely background
gas pressure, substrate temperature and number of laser pulses) has been
varied in order to control the nanostructure of the deposited films and
consequently optimize their gas sensing properties. Similarly, by carefully
choosing the deposition parameters, the PLD technique can be satisfactorily
used to deposit Pt nanoclusters (used as catalyst in gas sensing applications)
presenting a mean size that can be changed from 1.20.2 nm to 245
nm. Results concerning the characterization of both the nanostructure and
the gas sensing properties of PLD SnO2 films, as well as the influence
of Pt nanoclusters on the sensitivity of the films, will be presented.