Specifications

NOTE: The information contained in this page is taken from the website: www.wfl.elettra.eu

NOTE: the Photon flux is calculated at the maximum resolving power achievable with entrance and exit slit width set to 10 micrometer.
A further grating (SG4) provides 10 times higher flux in the same conditions (but lower resolution).

Since BACH employs two different undulators for different energy ranges, the user must select properly the undulator to work with. Important Note: the two undulators cannot be used simultaneously!!! When one of them is in use (gap below 100 mm) the other must be at the maximum gap (100 mm) and zero phase and zero tapering. If both gaps are below 100 mm a beam dump will occur and all beamlines will loose the beam!

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8.1 (High Energy)	From 175 eV-1650 eV	First harmonic:175 eV-730 eV LH: 177 eV-746 eV (gap19-gap50mm) LV: ~367-780 (gap19-gap50mm) CP: ~290-770 (gap19-gap50mm)	2.0 GeV
		First harmonic:247 eV-1030 eV LH: ~247 eV-1074 eV (gap19-gap50mm) LV: ~528-1100 eV (gap19-gap40mm) CP: ~418-1119 eV (gap19-gap50mm)	2.4 GeV
8.2 (Low Energy)	From 35/42 eV to more than 600 eV	First harmonic (highest flux):35* eV-440 eV *The lower Limit is dependent on the polarization and it is actually limited to 35 eV by the monochromator. LH: 16-20 eV (estimated)-140 eV LV: 43 eV-325 eV Circ: 30 eV-270 eV	2.0 GeV
		First harmonic (highest flux):42 eV-620 eV *The lower Limit is dependent on the polarization. LH: 30 eV (estimated)-200 eV LV: 61 eV-470 eV Circ: 44 eV-385 eV	2.4 GeV

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MONOCHROMATOR: ENERGY RANGES

SG1	44 eV-349 eV (35 eV-42 eV available under special request)	high resolving power: 20000-6000	flux>10¹¹
SG2	158 eV-597 eV	high resolving power: 20000-6000	flux>10¹¹
SG3	491 eV-1650 eV	high resolving power: 15000-5000	flux>10¹¹
SG4	301 eV-1650 eV	medium resolving power: 10000-2000	flux>10¹²

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SCIENTA OPERATION MODES

1) Transmission or Angle resolved photoemission from 35-44eV to 1650eV with circular, linear horizontal or linear vertical polarization
2) Partial/Auger Electron Yield (CFS)
3) Resonant Photoemission (CIS)
4) Series of measurements (i.e. core levels at different photon energies, series of resonant photoemission, temperature programmed XPS) can be run automatically.

ARPES GEOMETRY

Off-Line Tools and Facilities

Tool/Instrument	Specifications	Location
Hot Plate	50° C-500° C Max Load 5 kg. Max dim. 200x200 mm.	On the table between BACH acquisition room and LASER hutch
Ultrasonic Cleaning Machine		On the table between BACH acquisition room and LASER hutch
Electrical conductive UHV compatible silver epoxy, silver paint and insulating glues		BACH chemical cabinet
UHV compatible Carbon, Kapton and Copper tape; Several sample Clamps		BACH acquisition room
Hot gun
N2 gas line		close to the LASER hutch
Water cooling circuits		close to the LASER hutch
Electric Drill		Black box in the cabinet between BACH acquisition room and LASER hutch
Diamond Files, Sample preparation tools		BACH acquisition room
Pyrometer (reads above 300° C )		Cabinet or Main Chamber area
UHV Thickness monitor	Sycon Instruments STM-100/MF	(it can be mounted on the preparation chamber)
Vacuum sample storage box		Table close to the monochromator
Electromagnet (OFFLINE!)	up to ~2 Tesla
Magnetic coil in the prep chamber	variable field up to 1 kGauss	inside the preparation UHV chamber
Evaporators	http://www.elettra.trieste.it/lightsources/elettra/elettra-beamlines/bach/bach-endstations/page-6.html?showall=
Sample holders (http://www.elettra.trieste.it/lightsources/elettra/elettra-beamlines/bach/bach-endstations/page-5.html?showall=)	2 standard VG XL25VH 1 standard VG XL25HC 3 home-made sample carriers for heating by filament (for radiative sample heating up to 500° C or electron bombardment) (1 currently lended) 1 home-made sample carriers for heating by direct current up to 10 A (e.g. Si, Ge, SiC) 1 sample holder for standard Omicron Plates

Last Updated on Tuesday, 28 May 2019 17:39