Elettra-Sincrotrone Trieste S.C.p.A. website uses technical, analytics and third party cookies, in order to collect anonymous statistical informations.
Website navigation do not affect users' privacy during their browsing experience on our website, as they do not entail processing their personal identification data.
Session cookies are not permanently stored and indeed are cancelled when the browser has quit.
The technical cookies also improve or customise the browsing experience and are necessary to the website provided by Elettra - Sincrotrone Trieste S.C.p.A. to function properly.
More info
OK

VUVContactsResearchBeamline DescriptionSpecificationsManualsSafety

Specifications

Beamline: insertion device

source:	one 3-section undulator 12.506 cm period
polarisation:	horizontal
energy range:	16-1000 eV
number of periods	36
Deflection parameter K	< 5.3
Source size (sigma)	243 x 56 mm² (H x V) at 100 eV
Source divergence (sigma)	74 x 70 mrad² (H x V) at 100 eV

Beamline: monocromator

type:	spherical grating monochromator
number of gratings:	5
pre-focussing mirrors:	2 spherical
refocussing mirror	toroidal
energy Range	20-750 eV
resolving power:	20 000 @ 65 eV, 15 000 @ 400 eV

Preparation chamber

base pressure	low 10^-10 mbar
manipulator's degrees of freedom	5
temperatures	100-160 to 400K (to 2500K in a separated heating station)

“in situ” UHV samples preparation
Low energy electron diffraction
Ion sputtering
Annealing
Gas lines
Metal beam epitaxy
Microbalance

Heating station

High temperature (2500K) annealing
CVD (chemical vapor deposition) up to 10-3 mbar
Magnetizing coil

Main chamber

base pressure	10^-11 mbar
manipulator's degrees of freedom	5 (motorized azimuthal angle motion)
temperatures	9 - 450K on vertical manipulator

Scienta R4000 Analyzer

30 degrees angle range (670 channels in parallel acquisition)
Angle resolution from 0.1°
Energy resolution from 1 to 10 meV