Research
Research Activities:
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Fabrication of high aspect ratio microstructures (Typ. 30:1), Maximum etching depth ~ 2 mm;
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Processing of PMMA and SU-8.
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Fabrication of EDM electrodes for industrial applications
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Patterning of silica thin films
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Direct patterning of block copolymers
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In situ synthesis of nanoparticles
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Direct patterning of functional devices in silica, hybrid silica, titania, zinc oxide, nickel oxide
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Patterning of titanosilicate mesoporous Pillared Planar Nanochannels
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Patterned supports to position and functionalize metal-organic framework crystals
Ultima modifica il Lunedì, 19 Agosto 2013 11:33