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DXRL
Welcome to DXRL @ Elettra
Deep X-ray lithography (DXRL) allows the production of high aspect ratio three dimensional structures in polymer with quasi perfect side-wall verticality and optical quality roughness. These structures can then be used as templates to mass-produce microparts made out of a large variety of metals, alloys or ceramics. The technique used to fabricate these parts is called LIGA.
It opens a wide variety of potential applications in the field of microelectromechanical systems (MEMs), fibre and integrated optics, microfluidic devices and interconnection technology. Moreover, the beamline performs an irradiaiton of samples with controlled X-ray doses, allowing therefore material science studies and the fabrication of microdevices made of new materials.
DOWNLOAD ELETTRA DXRL INFORMATION_pdf
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Research Highlights
Deep X-ray lithography on “sol–gel” processed noble metal mesoarchitectured films
A noble metal xerogel mesostructured with block-copolymers has been successfully employed as a lithographic resist.
Maxime Gayrard et al, Nanoscale, Vol. 14 - 5, pp. 1706-1712 (2022) DOI: 10.1039/d1nr07455e
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Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks
We demonstrate the resist-free, direct X-ray and electron-beam lithography of Metal–organic frameworks (MOFs)
Tu M. et al, Nature Materials, Vol. 20 - 1, pp. 93-99 (2021), DOI:10.1038/s41563-020-00827-x .
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X-Ray Lithography for Nanofabrication: Is There a Future?
We describe X-ray lithography technique, its latest advancements and perspectives.
Bharti Amardeep et al.;
Frontiers in Nanotechnology, Vol. 4, 835701 (2022)
doi: 10.3389/fnano.2022.835701 (Journal Article)
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User Area
We invite users and industrial customers to contact
(TU Graz)
NFFA Proposal Submission
How to get an official beamtime to a multiple technique facility including DXRL
http://www.nffa.eu/apply
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News
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Ultima modifica il Venerdì, 02 Settembre 2022 15:24