Specifications

Beamline: insertion device

source:	Linear Planar Undulator (LPU) from Kyma s.r.l. divided in 2 sections
period:	46 mm
number of periods:	98
polarisation:	linear horizontal
minimum gap:	13.5 mm
energy range:	90 - 1200 eV
peak brilliance:	~ 4 x 1018 ph/s/100 mA/0.1% BW/mm2/mrad2 1)

¹⁾ Evaluated for 400 eV photon energy with a storage ring energy of 2.0 GeV.

Harmonics at 2.0 GeV

SPEM microscope Lateral resolution: best 40 nm Energetic resolution: see Energetic Resolution Table microspot size (FWHM): best with currently available ZPs 120 nm angle of incidence: 90° sample-photon beam Beamline optics   toroidal prefocusing mirror Monocromator   Spherical Grating Monochromator (plane mirror and spherical grating)   fixed entrance slit (Hor)   fixed exit slit (Hor+Ver)   range: 400-1200 eV   resolving power: see Resolving Power of Monochromator

Energy Resolution Lateral Resolution

Sample

Samples must be conductive. Insulators are hardly imaged due to charging

Sample maximum dimension is 10x10x10 mm to fit sample Holder dimension

Sample Holder scheme (pdf)

	Samples can be heated up during measurements to 1100 K by e-beam bombardment, filaments, Al2O3, BN heaters
	Samples can be cooled down to 150 K using liquid nitrogen
	Voltage and Current can be applied to the sample through electrical contacts (3 electrical contacts + 2 Termocouple contacts + GRD)
	The maximum pressure allowed during microscopy experiments is 1·10-6 mbar.