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BaDElPh Specifications
Specifications
General Properties |
Beamline Energy Resolution | 3 * 10-1 [meV] @ 9 [eV] 6 * 10-1 [meV] @ 23 [eV] 1 [meV] @ 31 [eV] |
Beamline Resolving Power | 3 * 10-5 [E/deltaE] @ 9 [eV] 2 * 10-5 [E/deltaE] @ 23 [eV] 3 * 10-5 [E/deltaE] @ 31 [eV] |
Beamline Energy Range | 4.6 - 40 [eV] |
Max Flux On Sample | 6 * 1012 [ph/s] @ 9 [eV] 2 * 1012 [ph/s] @ 23 [eV] 1 * 1012 [ph/s] @ 31 [eV] |
Spot Size On Sample Hor | 300 - 400 [um] |
Spot Size On Sample Vert | 10 - 400 [um] |
Angle Of Incidence Light On Sample Value | 20 - 110 [degrees] |
Control And Data Analysis |
Control Software Type | LabVIEW, SpecsLab2 |
Data Output Type | Spectra, images |
Data Output Format | Text, Igor, sp2 formats |
Softwares For Data Analysis | Igor Pro |
Photon Sources
Figure-8 undulator
Type | Undulator |
Available Polarization | Linear horizontal, Linear vertical |
Variable Polarization | Yes |
Energy Range | 4.6 - 50 [eV] |
Number Of Periods | 32 |
Period | 140 [mm] |
Additional Lightsources
VUV source
Type | He discharge lamp |
Central Wavelength/Energy | 21 [eV] |
Beam shape | Gaussian |
Polarisation | Unpolarized |
x-ray source
Type | Lamp based on x-ray fluorescence of Al and Mg solid targets |
Central Wavelength/Energy | 1253 [eV] |
Beam shape | Gaussian |
Polarisation | Unpolarized |
Monochromators
NIM monochromator
Energy Range | 4.6 - 40 [eV] |
Type | 4-m-long normal incidence monochromator (NIM) with a constant included angle of 5° |
Resolving Power | 3 * 10-5 [deltaE/E] @ 9 [eV] |
Number Of Gratings | 3 |
Grating Type | 1) Al/MgF2 grating with 1500 l/mm, laminar profile, photon energy range 4.6-13 eV. 2) SiC grating with 3000 l/mm, laminar profile, photon energy range 15-19 eV. 3) Pt grating with 3000 l/mm, blaze profile, photon energy range 14-40 eV. |
Pre-focusing Mirror Type | Spherical mirror. The bare silicon portion of the surface of the mirror is used for photon energies up to about 13 eV while the reflectivity of the Pt-coated part is suitable for higher photon energies. |
Refocusing Mirror Type | Gold-coated toroidal mirror. |
Other Optics
Switching mirror
Description | The silicon plane-switching mirror deflects the radiation from the Figure-8 undulator from the IUVS beamline toward the BaDElPh branch. |
Endstations or Setup
Endstation
Diffractometer | Omicron SPECTALEED low enery electron diffraction (LEED) optics |
Spectrometer | SPECS Phoibos 150 hemispherical electron analyzer with a 2D-CCD detector |
Base Pressure | 2 * 10-11 [mbar] |
Detectors Available | 2D-CCD imaging detector |
Endstation Operative | Yes |
Sample |
Sample Type | Crystal |
Other Sample Type | Policrystal, thin film, powder |
Mounting Type | Fixed on home-made sample flag |
Required Sample Size | X = 10 [mm], Y = 10 [mm], Z = 8 [mm] X = 1 [mm], Y = 1 [mm], Z = 0.1 [mm] |
Manipulator or Sample stage |
Manipulator |
Description | The sample manipulator has five degree of freedom (xyz translations, polar and azimuthal rotational axes). It is based on a open-cycle helium cryostat (ARS LT-3M), is fully motorized (by stepper motors for the polar rotation and xyz translations and by the piezo motor for the azimuthal rotation), and it can be remotely controlled. The temperature can be measured by a calibrated C-type thermocouple and by a standard silicon diode (DT-470) installed next to the sample and on the cold finger, respectively. The head of the cryostat includes also a cartridge heater allowing a remote control of the temperature in the range 5-400 K. |
Degrees Of Freedom | 5 |
Translator Stages | 3 |
Cradles | 2 |
Positioning Precision | X = 5 [um], Y = 5 [um], Z = 5 [um] |
Range Of Movement | X = 50 [mm], Y = 50 [mm], Z = 600 [mm] |
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Sample Environment |
Exp-chamber |
Description | The Experimental or Analysis chamber is in mu-metal and houses the electron energy analyzer, a SPECS Phoibos 150 with a 2D-CCD detector system, a high-intensity VUV source (He, Omicron HIS 13), a conventional X-ray source (Al & Mg, PSP TX400), a low-energy electron diffraction (LEED) optics (Omicron SpectaLEED), a home-made gas-cell, and a residual gas analyzer (SRS RGA200). It is connected through a valve to the UHV Preparation chamber. |
Pressure (min) | 2 * 10-11 [mbar] |
Pressure (Max) | 1 * 10-7 [mbar] |
Temperature | 10 - 400 [K] |
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Fast-entry lock |
Description | In the fast-entry chamber up to two samples per time can be loaded from air and in about 60 minutes can reach a pressure of about 10^-6 mbar. It is connected through a valve to the UHV Heater chamber. |
Pressure (min) | 2 * 10-7 [mbar] |
Pressure (Max) | 1 * 103 [mbar] |
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Heater chamber |
Description | The Heater chamber houses an electron bombardment heater stage for high-temperature (up to about 2400 K) annealing of the sample and a 7-slot sample flag parking device. It has also several free flanges to mount the needed tools for the required sample preparation (cleavage, scraping, gas treatment, quartz microbalance...) and for UHV in-situ growth of thin films. It is connected through valves to the fast-entry lock and the UHV Preparation chamber. |
Pressure (min) | 3 * 10-10 [mbar] |
Pressure (Max) | 1 * 10-6 [mbar] |
Temperature | 300 - 2400 [K] |
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Prep-chamber |
Description | The Preparation chamber houses the five degree of freedom liquid-He cryostat manipulator and it is normally equipped with an ion sputter gun (Varian), a quartz microbalance, and a silver evaporator. It has also several free flanges to mount the needed tools for the required sample preparation (cleavage, gas treatment...) and for UHV in-situ growth of thin films. It is connected through valves to the UHV Heater and Analysis chambers. |
Pressure (min) | 3 * 10-11 [bar] |
Pressure (Max) | 1 * 10-6 [bar] |
Temperature | 10 - 400 [K] |
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Sample Holders |
Flag sample holder |
Type | heating / cooling devices |
Description | Home-made sample flag compatible with Omicron- and Specs-like flag sample holders. The Omicron- and Specs-like flag sample holders can be used with a suitable adapter. |
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Detectors
2D-CCD imaging detector
Type | CCD sensor |
Description | by SPECS with PCO PixelFly camera |
Time Resolved | Yes |
Pixel Size | X = 9.9 [um], Y = 9.9 [um] |
Array Size | X = 640 [pixel], Y = 480 [pixel] |
Passive or Active (Electronics) | Active |
Dynamic Range | 1 * 103 |
Output Readout Software | SpecsLab2 |
Detection |
Detected Particle | Electron |
Ultima modifica il Giovedì, 14 Febbraio 2019 16:17