Specifications
Pagina 5 di 8
Endstations
SPELEEM III (Spectroscopic photoemission and low energy electron microscope)
Microscopes | Spectroscopic photoemission and low energy electron microscope (SPELEEM III, Elmitec GmbH), with magnetic triode objective and 120° separator. Imaging techniques: LEEM, EELS-LEEM, XAS-PEEM, XMCD-PEEM, XMCLD-PEEM; microspot diffraction techniques: μ-LEED, μ-ARUPS, μ-ARPES, μ-EELS, μ-XPD. microspot spectroscopy techniques: μ-ARUPS, μ-ARPES, μ-XPD, μ-LEED, μ-EELS. Contrast apertures : 10, 30 and 100 µm. Illumination apertures (size on sample): 500 nm, 1 and 6 µm. Lateral resolution: 10 nm in LEEM, 30 nm in XPEEM Sample types: UHV compatible, flat with resistivity of few tens Ohms / cm | ||||||||||
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Spectrometer | Hemispherical energy analyzer Elmitec R200 pass energy: 820 eV energy resolution: 100 meV (spectral imaging) 100 meV (diffraction imaging) 60 meV (microspot spectroscopy) | ||||||||||
Base Pressure | 7 * 10-11 [mbar] | ||||||||||
Detectors Available | Retiga R6 CCD flange mounted Chevron MCP | ||||||||||
Endstation Operative | Yes | ||||||||||
Sample | |||||||||||
Sample Type | Crystal, Amorphous | ||||||||||
Other Sample Type | micro-structured, lithographically patterned samples | ||||||||||
Mounting Type | Elmitec sample cartridge, custom designed sample cartridge | ||||||||||
Required Sample Size | X = 9 [um], Y = 9 [um], Z = 1 [um] | ||||||||||
Manipulator or Sample stage | |||||||||||
Elmitec Manipulator with motorized x,y stage, tilt and azimuthal rotation |
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Sample Environment | |||||||||||
Sample Cartridge for Elmitec LEEM III Environment |
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Sample Holders | |||||||||||
Sample cartridge for in-situ, in-plane magnetization |
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Sample cartridge for in-situ, out-of-plane magnetization |
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Standard sample cartridge for Elmitec LEEM III microscope |
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Magnetic Fields | |||||||||||
Magnetization stage in UHV |
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The sample temperature is read by a type C thermocouple (W5%Re/W26%Re), which is mounted close to the sample, or with an optical pyrometer. The type C thermocouple calibration parameters can be found here.
Important note on samples
It is very important is to keep in mind that not all samples are suitable for XPEEM experiments and special requirements have to be fulfilled. Samples must be conductive and resistant to radiation damage. It is essential that they are free from field emitters and tips. The sample geometry must also satisfy basic requirements. Lithographically patterned samples have to be carefully designed.
Ultima modifica il Giovedì, 05 Maggio 2022 14:38