Elettra-Sincrotrone Trieste S.C.p.A. website uses session cookies which are required for users to navigate appropriately and safely. Session cookies created by the Elettra-Sincrotrone Trieste S.C.p.A. website navigation do not affect users' privacy during their browsing experience on our website, as they do not entail processing their personal identification data. Session cookies are not permanently stored and indeed are cancelled when the connection to the Elettra-Sincrotrone Trieste S.C.p.A. website is terminated.
More info

Optical Metrology Laboratoy

The main aim of the X-ray metrology lab is in general to achieve the complete characterization of the X-ray mirror surface topography. Improvement of focusing accuracy has been a major consideration in the use of grazing incidence optics in X-ray applications, e.g., in synchrotron or FEL beam line instrumentation.
This task of paramount importance is achieved via accurate metrology. Profilometers measuring the global shape while roughness measurements ”sample” the optical surface. The treatment of complete topography of the optical surface is traditional divided in two principal branch: the study of profile at the long spatial wavelengths (in a range comparable with the mirror length) and the study of the microroughness at shorter spatial wavelength, by means of the Power Spectral Density (PSD). Owing to the finite scan size and resolution, each instrument has a finite window of spectral sensitivity. Therefore, we have to use different instruments, each one is sensitive only to a particular window of spatial frequencies. The Power Spectral Density provides a global description of the statistical properties of the roughness over a vast spectral extent.
In the following we describe the instrumentation used at X-ray metrology Lab for characterizations performed on mirror samples.

Last Updated on Monday, 14 September 2020 10:54