Manual_Positions

PHOTODIODE (photon counts)
1=ground
2=BNC

TRANSFER&EVAPORATION Positions

Normal photon beam incidence: 178.5 degree. Normal electron emission: 238.5 degree. Normal photon emission: 118.5 degree. 

TRANSFER x y z theta NOTES
           
  28 20 24.9 (1.0) 180 RT
           
IMPORTANT: Before rotating and during the rotation, always watch and monitor the sample holder through the CF40 window on top of the chamber. Also look at the monitor with the camera (camera 3) watching the LEED. There is high risk of hitting the MCP or the analyser or the LEED!!
 
EVAPORATION x y z theta
Co-Position2 Omicron Triple
(sept 2018)*
*sample in a lower right position
30 26.9 10.1 (1) 335°
Co-Position2 Omicron Triple
(march 2016)*
Sample ~ centerPBN
26.5 25.3 9.8(2.0) 335°
Ti-Position 1-Omictron Triple (sep 2012) 20 31.69 9.35 335°
Mn
2-Triple
(centro Si)
21.55 24.3 9.45 335°
Pd
2-Triple
(centro PBN)
May 2013
24.9 25.3 9.8 (2) 335°
3-Triple        
Fe Single
(sep. 2012)
25.0 32.5 24.8 304*
Fe single
ebeam holder Nov2014 (Pt111)
20.2 33.63 25 306
Y single
may 2013
26 35.2 25.1 304*
IMPORTANT: In order to switch off the Omicron evaporators:
1. Turn HV to min
2. Turn I to 0 A
3. Set the controller to STAND BY (IMPORTANT!!!!)
4. Wait for 30 minutes then close water (fist close IN then close OUT)
 

LEED&SPUTTERING Positions

LEED x y (CAREFUL!!) z theta
CENTER PBN 34.2 40 24.55 (1.8) 355
PBN-Pt111 mounted in the lower right position (Sept2018) 34.2 40 (LEED retracted 5 turns) 24.8 360
CENTER e-beam (VG LEED) 33 40 25.15 354.5
BEFORE LEED: Always turn on the Camera 3 before rotating the sample in front of the LEED. Do not rotate for y>25!


SPUTTERING x y z theta NOTES
grazing (33.5 microA on Ni) 23.4 (10/2013)
20.96 (23/7/13)
31.83 (10/2013)
28 (7/2013)
9.75 (2) 8 used in March 2015
(PBN)
  45 37.45 10 36 March2015
normal 21.7 40.7
31.35 (23/7/13)
9.75 54 old

IMPORTANT:BEFORE SPUTTERING! Close the last beamline Valve and Switch off the XPS before introducing Ar in the chamber.
Ar pressure=1.2 x10-6 mbar. Do not sputter more than 15 minutes.

SPUTTERING IN THE PREP: position 2, marker (quello più avanti quando il campione e' montato più in basso))

MAGNETIZATION x y z theta
grazing (33.5 microA on Ni) 29.2 ~~40 25 135

SMALL BEAM SETUP 

11/10/2019
SMALL BEAM FOR SG1 ARPES.
Z MIRROR (PVA)="XPS" (+8 TURNS from "0"; +14 TURNS from "RIXS")
POSTVERA PITCH=-7900 
POSTHORA PITCH=-41600; 
Beam size: 100? micron
--------------------------------------------------------------------------------------------------------

PREVIOUS VALUES FOR XPS SMALL BEAM <50 micron?
Z MIRROR POSITION: tacca "0"
POSTVERA PITCH=-6250 SG1
POSTHORA PITCH=-44100 SG1

POSTVERA PITCH=-6300 SG2
POSTHORA PITCH=-45000 SG2

POSTVERA PITCH=-5850 SG3
POSTHORA PITCH=-45000 SG1

LARGE BEAM SETUP: 

Z MIRROR POSITION: -6 (partendo da "0" -6 giri verso posizione RIXS)
POSTVERA PITCH=-7600 SG3 (2019)
POSTHORA PITCH=-43200 SG3 (2019)

POSTVERA PITCH=--7600 SG1 (2019)
POSTHORA PITCH=-41700 SG1 (2019)

POSTVERA PITCH=-8150 SG2
POSTHORA PITCH=-45300 SG2






XPS x y z theta    
e beam center FEDE 27.9 30 9.95 180    
PBN-center
(Au norm emiss)
26 30.2 10.1 237.5    
PBN-center 28 30.12 10.0 (0.5) 180 NI Ag110 Feb2015
PBN-center 28.8 28.79 10.0 (0.5) 239 NE  
PBN-Pt111 low, right 22.8 29.07 10.1(1.5) 180 NI Sept2018
PBN-Pt111 low, righ 25.55 31.1 10.1(1.5) 240 NE Sept2018
PBN-Pt111 low, righ 26.15 31.95 10.1(1.5) 250 NEXAFS Sept2018
Si-Center 24.44 29.19 10.0(2.4) 231.5    
Si-Center NI 31.5 30.4 10.0(2.4) 178.5    
Si-Center NE 29.26 29.24 10.0(2.4) 236.5    
Au manip 29.2 27.4 11.4 (2.0) 180    

x>25 at NI at GI decrease x
x<25 at NI at GI increase x

MIRROR POSITIONS spot size PostHorA PostVerA PostVer z
SG1-XPS
(sep. 2012)
200x300 -55000 sept 2012/ -48800 oct 2013 -6900 MARKER about on the 0
and label on the wheel "RIXS"
(2013, only for XPS. FOR XAS the intensity improves at rixs+16)

xps=rixs+10 and 1/4 turn
SG2-XPS (sep. 2012)   -53400 sept 2012/ -51300 oct 2013 -6900  
SG3-XPS (sep. 2012)   -51500
(-55000 is also ok)/ -50400 oct 2013
-6900  
SG4-XPS
(sep. 2012)
  -55000 sept 2012/ ....... -6900  
SG4-RIXS 20x300 -42000 -2484 rixs-6 turns
    H Moves from the ring to out of the ring: - to + V moves from down to up: - to +  

RIXS x y z theta
PBN-center 18.7? 27 10.65 178.5
  15.6? 30?   120
         
dimension/HOR/VER 20x300 -43000 -2484  
 




OLD MIRROR POSITIONS FOR VSW ANALYSER, CURRENTLY NOT INSTALLED (REPLACED BT SCIENTA3000)
XPS-VSW (OLD!!!
DO NOT USE THESE VALUES)
spot size PostHorA (VSW, old) PostVerA (VSW, old) PostHor z
SG1-XPS 200x300 -45087 VSW (old) -8000 xps=rixs+10
SG2-XPS   -49000 VSW (old)    
SG3-XPS   -46939 VSW (old)    
SG4-XPS   -47250 VSW (old)    
SG4-RIXS 20x300 -42000  -2484 rixs-6
    H Moves from the ring to out of the ring: - to + V moves from down to up: - to +  

NOTE: These are old positions, valid only for VSW

Micrometro prevert pitch dentro hutch (lungo in fascio): 26 mm (9/12/2009). Era: 23 mm il 8/12/2009. Da 26 a 23 il preverpitch si e' spostato di circa 600 micron verso valori piu' bassi (da oltre 400 a -186).

Ultima modifica il Giovedì, 31 Ottobre 2019 13:57