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Specifications
Beamline: bending magnet
Source: |
Bending Magnet (E=2GeV: Ec=3.2 KeV, E=2.4 GeV: Ec=5.5 KeV) |
Polarization: |
linear, right and left elliptical |
Energy range: |
2.7-1600 eV |
Spot size |
30 μm x 100 μm (vertical x horizontal) – typical |
Divergence |
<20x20 (h x v) mrad2 |
Higher order rejection |
Filters (Pyrex, B270, SiO2, LiF, MgF2, In, Sn, Mg, Al, Si, Ag, B, Ti) & Monochromator deviation angle |
Beamline: monochromator
grating |
energy range |
resolving power |
typical flux |
G1200 (1200 ll/mm) |
40-1600 eV |
3000 @ 400 eV |
typical 1011 photons/s at 100 eV with E/ΔE = 3000 |
G1800 (1800 ll/mm) |
200-1600 eV |
5000 @ 400 eV |
typical 1010 photons/s at 600 eV with E/ΔE = 3000 |
GNIM (1200 ll/mm) |
2.7-50 eV |
2000 @ 20 eV |
typical 1010 photons/s at 20 eV with E/ΔE = 2000 |
Spectroscopy chamber
Preparation chamber
Sample annealing |
T ~ 1200°C |
Equipment |
ion sputtering, LEED, CMA/AES |
Sample cooling: |
LN cooling (100 K) |
Sample annealing |
T ~ 200°C max |
Evaporators |
metals, insulators, organic, Tricon models |
Last Updated on Monday, 28 November 2022 10:17