Specifications
Specifications
| General Properties |
|---|
| Beamline Energy Range | 6 - 20 [keV] |
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| Max Flux On Sample | 10 * 1011 [ph/s] @ 9 [keV] |
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| Spot Size On Sample Hor | 300 - 2000 [um] |
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| Spot Size On Sample Vert | 300 - 1000 [um] |
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| Divergence Hor | 0.1 - 1 [urad] |
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| Divergence Vert | 0.05 - 0.3 [urad] |
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| Control And Data Analysis |
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| Control Software Type | In house developed software written in Python/PyQt |
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| Data Output Type | 1D and 2D Diffraction patterns |
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| Data Output Format | ascii (xy, gsas), tiff |
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| Softwares For Data Analysis | PDF4, GSAS, FullProf, Elin |
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Photon Sources
Bending magnet 2.0
| Type | Bending Magnet |
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| Source Size Sigma | X = 139 [um], Y = 28 [um] |
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Bending magnet 2.4
| Type | Bending Magnet |
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| Source Size Sigma | X = 197 [um], Y = 30 [um] |
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Monochromators
Monochromator
| Energy Range | 6 - 20 [keV] |
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| Type | Crystal monochromator: Si 111 |
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| Pre-focusing Mirror Type | cilndrical |
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| Refocusing Mirror Type | cilindrical |
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Endstations or Setup
Diffractometer
| Description | 4 circle diffractometer with xyz translation stage. Other availble equipment for this set-up ; Gasblower (max 1000°C), Cryojet (Min.100K), cooling/heating chamber (Min -20°C - Max 130°C) |
|---|
| Diffractometer | Huber 4-circle diffractometer with 3D translation stage |
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| Detectors Available | fast scintillator detector
Silicon Drift Detector
marCCD |
|---|
| Endstation Operative | Yes |
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| Sample |
|---|
| Sample Type | Powder |
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| Other Sample Type | Thin films and any other polycristalline objects |
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| Manipulator or Sample stage |
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| Manipulator |
| Positioning Precision | X = 1 [um], Y = 1 [um], Z = 1 [um] |
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| Range Of Movement | X = 15 [mm], Y = 15 [mm], Z = 5 [mm] |
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|
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| Sample Holders |
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| Sample holder 1 |
|
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| Sample holder 2 |
|
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Furnace
| Description | Furnace with an atmosphere and temperature controlled environment for powders in capillaries. The diffraction patterns are collected on a translating image plate (IP). |
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| Diffractometer | Furnace maximum temperature 1000°C. |
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| Endstation Operative | Yes |
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| Sample |
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| Sample Type | Powder |
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| Mounting Type | capillary (optional with controlled gas-flow ) |
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| Manipulator or Sample stage |
|---|
| Manipulator |
|
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| Sample Environment |
|---|
| Sample holder Environment |
| Temperature | 300 - 1273 [K] |
|---|
|
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| Sample Holders |
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| Sample holder |
|
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Detectors
fast scintillator detector
| Type | Fast scintillator counter |
|---|
| Passive or Active (Electronics) | Active |
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| Dynamic Range | 3 * 105 [counts/s] |
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| Detection |
|---|
| Detected Particle | Photon |
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marCCD
| Type | marCCD-SX-165 |
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| Pixel Size | X = 80 [um], Y = 80 [um] |
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| Array Size | X = 2048 [pixel], Y = 2048 [pixel] |
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| Passive or Active (Electronics) | Active |
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| Dynamic Range | 16 [bits] |
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| Detection |
|---|
| Detected Particle | Photon |
|---|
Silicon Drift Detector
| Type | Silicon Drift Detector |
|---|
| Passive or Active (Electronics) | Active |
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| Detection |
|---|
| Detected Particle | Photon |
|---|
References
The X-ray diffraction beamline MCX at Elettra: a case study of non-destructive analysis on stained glass
Plaisier Jasper Rikkert, Nodari Luca, Gigli Lara, Rebollo San Miguel Elena Paz, Bertoncello Renzo, Lausi Andrea
ACTA IMEKO, Vol. 6 - 3, pp. 71-75 (2017)
doi:
10.21014/acta_imeko.v6i3.464
MCX: A synchrotron radiation beamline for X-ray diffraction line profile analysis
Rebuffi L, Plaisier JR, Abdellatief M, Lausi A, Scardi P
Zeitschrift fur Anorganische und Allgemeine Chemie 640 3100–3106.
(2014).
doi: 10.1002/zaac.201400163
Last Updated on Tuesday, 19 February 2019 17:27
