Specifications

Beamline: insertion device

source:	2 Apple II type undulators 10 cm period,with phase modulation electromagnet
polarisation:	linear horizontal, linear vertical, elliptical
energy range:	5-1000 eV

Beamline: monochromator

grating	energy range	resolving power	maximum flux
VLS 400	200-1000 eV	4000 @ 400 eV	more than 1·1012 ph/sec   [250-600 eV]*
VLS 200	50-300 eV	4000 @ 200 eV	more than 1·1013 ph/sec  [100-200 eV]*
SG 10	5-20 eV	1000 @ 20 eV	−

(*) at 200mA ring current, 2.0 GeV; 10 μm exit slit width.

NanoESCA - PEEM instrument

The design includes a non-magnetic, electrostatic PEEM lens and a double-pass hemispherical analyser. Rapid PEEM survey imaging (< 50 nm resolution) can be used to locate features, whilst its lateral resolution in imaging ESCA of 650 nm in the laboratory and 150 nm at the Synchrotron are simply unique.

Principles of operation

With the PEEM column of the NanoESCA, two imaging modes are accessible: real space (a, left) and k-space (a, right). The double hemispherical design of the energy-lter leads to major improvements in the aberration correction (b).

Patented concept of NanoESCA

• IDEA aberration-corrected band pass energy filter

• Compensation of first analyser errors by second analyser allows large slits (1-2mm) and small pass energy

• No intermixing of spatial and energy information 

• Result: high transmission imaging energy analyser

Spatial Resolution FIB - patterned Au (10 nm) on Si

Energy Resolution

Technigue	Pass Energy (eV)	Slit width (mm)	Analyser resolution (meV)
Hg-Source	50	1	400
micro-XPS/UPS	100	1	395
micro-XPS/UPS	100	0.5	200
micro-XPS/UPS	50	1	195
micro-XPS/UPS	50	0.5	100
micro-XPS/UPS	25	1	100

Endstation facilities

Sample station The liquid helium cooled sample manipulator with six degrees of freedom - temperature range:  30-400 K using liquid helium 100-400 K using liquid nitrogen

Preparation chamber Base pressure low 10-10 mbar. “in situ” UHV samples preparation Low energy electron diffraction Ion sputtering Auger system Annealing Gas lines .