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Specifications

Beamline: insertion device

source: 2 Apple II type undulators 10 cm period,with phase modulation electromagnet
polarisation: linear horizontal, linear vertical, elliptical
energy range: 5-1000 eV

Beamline: monochromator

grating energy range resolving power maximum flux
VLS 400 200-1000 eV 4000 @ 400 eV more than 1·1012 ph/sec   [250-600 eV]*
VLS 200 50-300 eV 4000 @ 200 eV more than 1·1013 ph/sec  [100-200 eV]*
SG 10 5-20 eV 1000 @ 20 eV
(*) at 200mA ring current, 2.0 GeV; 10 μm exit slit width.


NanoESCA - PEEM instrument

The design includes a non-magnetic, electrostatic PEEM lens and a double-pass hemispherical analyser. Rapid PEEM survey imaging (< 50 nm resolution) can be used to locate features, whilst its lateral resolution in imaging ESCA of 650 nm in the laboratory and 150 nm at the Synchrotron are simply unique.


Principles of operation

With the PEEM column of the NanoESCA, two imaging modes are accessible: real space (a, left) and k-space (a, right). The double hemispherical design of the energy-lter leads to major improvements in the aberration correction (b).


Patented concept of NanoESCA

• IDEA aberration-corrected band pass energy filter

• Compensation of first analyser errors by second analyser allows large slits (1-2mm) and small pass energy

• No intermixing of spatial and energy information 

• Result: high transmission imaging energy analyser


Spatial Resolution

FIB - patterned Au (10 nm) on Si


Energy Resolution


Technigue

Pass Energy
(eV)

Slit width
(mm)

Analyser resolution
(meV)

Hg-Source

50

1

400

micro-XPS/UPS

100

1

395

micro-XPS/UPS

100

0.5

200

micro-XPS/UPS

50 1 195

micro-XPS/UPS

50

0.5

100

micro-XPS/UPS

25

1

100


Endstation facilities

Sample station

The liquid helium cooled sample manipulator with six degrees of freedom
- temperature range: 
30-400 K using liquid helium
100-400 K using liquid nitrogen
 









 

Preparation chamber

Base pressure low 10-10 mbar.
in situ” UHV samples preparation
Low energy electron diffraction
Ion sputtering
Auger system
Annealing
Gas lines


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Last Updated on Monday, 11 November 2019 16:18